• DocumentCode
    1483805
  • Title

    Critical area computation for missing material defects in VLSI circuits

  • Author

    Papadopoulou, Evanthia

  • Author_Institution
    IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    20
  • Issue
    5
  • fYear
    2001
  • fDate
    5/1/2001 12:00:00 AM
  • Firstpage
    583
  • Lastpage
    597
  • Abstract
    We address the problem of computing critical area for missing material defects in a circuit layout. The extraction of critical area is the main computational problem in very large scale integration yield prediction. Missing material defects cause open circuits and are classified into breaks and via blocks. Our approach is based on the L medial axis of polygons and the weighted L Voronoi diagram of segments. We also introduce the min-max Voronoi diagram of rectangles, a combinatorial structure of independent interest. The critical area problem for breaks and via blocks is reduced to variations of weighted L Voronoi diagram of segments. Plane sweep algorithms to compute the appropriate Voronoi diagrams for each case are presented. As a result, the critical area for breaks and via blocks on a single layer can be computed accurately in one pass of the layout. The time complexity is O(n log n) in the case of breaks and O((n+K)log n) in the case of via blocks, where n is the size of the input and K is upper-bounded by the number of interacting vias (in practice K is small). The critical area computation assumes square defects and reflects all possible defect sizes following the D(r)=r02/r3 defect size distribution. The method is presented for rectilinear layouts
  • Keywords
    VLSI; computational geometry; integrated circuit layout; integrated circuit yield; L medial axis; VLSI circuit layout; break; critical area; min-max Voronoi diagram; missing material defect; open circuit; plane sweep algorithm; via block; yield prediction; Conducting materials; Costs; Density functional theory; Distributed computing; Integrated circuit interconnections; Integrated circuit modeling; Large scale integration; Manufacturing processes; Shape; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/43.920683
  • Filename
    920683