DocumentCode
1485521
Title
Process and characterization of nitrogenated carbon
Author
Yang, Ming M. ; Chao, James L. ; Russak, Michael A.
Author_Institution
HMT Technol. Corp., Fremont, CA, USA
Volume
33
Issue
5
fYear
1997
fDate
9/1/1997 12:00:00 AM
Firstpage
3145
Lastpage
3147
Abstract
Nitrogenated carbon films prepared in a DC-magnetron sputtering system were studied. Properties, including deposition rate, nitrogen content, nano-hardness, and thin film stress, were investigated as a function of deposition conditions, i.e. sputter power, substrate bias, substrate temperature, and sputter pressure
Keywords
carbon; hardness; internal stresses; nitrogen; sputtered coatings; wear resistant coatings; C:N; DC magnetron sputtering; deposition rate; nanohardness; nitrogen content; nitrogenated carbon thin film; stress; Argon; Chaos; Magnetic materials; Nitrogen; Protection; Silicon; Sputtering; Stress; Substrates; Temperature;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.617872
Filename
617872
Link To Document