DocumentCode
1489557
Title
X-ray lathe: An X-ray lithographic exposure tool for nonplanar objects
Author
Feinerman, Alan D. ; Lajos, Robert E. ; White, Victor ; Denton, Denice D.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Illinois Univ., Chicago, IL, USA
Volume
5
Issue
4
fYear
1996
fDate
12/1/1996 12:00:00 AM
Firstpage
250
Lastpage
255
Abstract
An X-ray lithography lathe has been developed that can pattern cylindrical, ellipsoidal, and other nonplanar objects. This lathe is capable of patterning on a micron scale a wide variety of shapes including shapes impossible to achieve with a conventional lathe. A cylindrical core covered with a suitable resist is rotated while being exposed with a collimated X-ray source through a mask. The mask absorbs X rays up to a particular radius from the center of the core and the resist beyond that radius is removed in a developer. Several cylindrical cores were coated with poly(methylmethacrylate) (PMMA) 5 to 125 μm thick and patterned with X-rays down to a 250-μm horizontal scale (along the lathe axis). The exposure time for a cylindrical PMMA layer is ~three-four times longer than a planar layer with the same thickness. The capabilities of this technology, lathe apparatus, dose calculations, and initial exposure results are described
Keywords
X-ray lithography; micromechanical devices; 5 to 125 mum; LIGA; PMMA; X-ray lithographic exposure tool; X-ray lithography lathe; X-ray sensitive resist; collimated X-ray source; cylindrical core; cylindrical objects; dose calculations; ellipsoidal objects; exposure time; lathe apparatus; mask; micron scale patterning; nonplanar objects; Collimators; Electron optics; Gears; Optical filters; Optical polymers; Optical sensors; Optical waveguides; Resists; Shape; X-ray lithography;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/84.546405
Filename
546405
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