Etch rates for micromachining processing

Author

Williams, Kirt R. ; Muller, Richard S.

Author_Institution

Berkeley Sensor & Acoust. Centre, California Univ., Berkeley, CA, USA

Volume

5

Issue

4

fYear

1996

fDate

12/1/1996 12:00:00 AM

Firstpage

256

Lastpage

269

Abstract

The etch rates for 317 combinations of 16 materials (single-crystal silicon, doped, and undoped polysilicon, several types of silicon dioxide, stoichiometric and silicon-rich silicon nitride, aluminum, tungsten, titanium, Ti/W alloy, and two brands of positive photoresist) used in the fabrication of microelectromechanical systems and integrated circuits in 28 wet, plasma, and plasmaless-gas-phase etches (several HF solutions, H₃PO₄, HNO₃+H₂O+NH₄F, KOH, Type A aluminum etchant, H ₂O+H₂O₂+HF, H₂O₂, piranha, acetone, HF vapor, XeF₂, and various combinations of SF₆, CF₄, CHF₃, Cl₂, O₂, N₂, and He in plasmas) were measured and are tabulated. Etch preparation, use, and chemical reactions (from the technical literature) are given. Sample preparation and MEMS applications are described for the materials

Keywords

etching; micromachining; micromechanical devices; sputter etching; surface cleaning; Al; H₂O-H₂O₂-HF; H₂O₂; H₃PO₄; HF; HF solutions; HF vapor; HNO₃-H₂O-NH₄F; KOH; MEMS applications; SF₆; SF₆-Cl₂-O₂-N₂-He; Si; Si₃N₄; SiN; SiO₂; Ti; Ti-W; Ti/W alloy; Type A aluminum etchant; W; XeF₂; acetone; chemical reactions; etch preparation; etch rates; integrated circuits; microelectromechanical systems; micromachining processing; piranha; plasma etching; plasmaless-gas-phase etching; polysilicon; positive photoresist; sample preparation; single-crystal Si; tetrafluoromethane; trifluoromethane; wet etching; wet wafer cleaning; Aluminum; Hafnium; Micromachining; Plasma applications; Plasma materials processing; Plasma measurements; Silicon compounds; Titanium; Tungsten; Wet etching;

fLanguage

English

Journal_Title

Microelectromechanical Systems, Journal of

Publisher

ieee

ISSN

1057-7157

Type

jour

DOI

10.1109/84.546406

Filename

546406