Surface-micromachined 2-D optical scanners with high-performance single-crystalline silicon micromirrors

Author

Su, Guo-Dung John ; Toshiyoshi, H. ; Wu, M.C.

Author_Institution

Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA

Volume

13

Issue

6

fYear

2001

fDate

6/1/2001 12:00:00 AM

Firstpage

606

Lastpage

608

Abstract

We have developed a novel batch-fabrication single-crystalline silicon micromirror bonding process to fabricate optically flat micromirrors on polysilicon surface-micromachined two-dimensional (2-D) scanners. The electrostatically actuated 2-D scanner has a mirror area of 460 μm×460 μm and an optical scan angle of /spl plusmn/7.5/spl deg/. Compared with micromirror made by standard polysilicon surface-micromachining process, the radius of curvature of the micromirror has been improved by 150 times from 1.8 to 265 cm, with surface roughness <10 nm.

Keywords

micro-optics; micromachining; mirrors; optical fabrication; optical scanners; silicon; Si; batch-fabrication single-crystalline silicon micromirror bonding process; electrostatically actuated 2-D scanner; high-performance single-crystalline silicon micromirrors; optically flat micromirror; polysilicon surface-micromachined two-dimensional scanners; radius of curvature; surface roughness; surface-micromachined 2-D optical scanners; Bonding; Micromechanical devices; Micromirrors; Mirrors; Optical films; Residual stresses; Rough surfaces; Silicon on insulator technology; Surface roughness; Two dimensional displays;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.924038

Filename

924038