• DocumentCode
    1492916
  • Title

    Pulsewidth Variation of an Axial Vircator

  • Author

    Roy, Amitava ; Singh, Sandeep Kumar ; Menon, Rakhee ; Kumar, D. Senthil ; Khandekar, Saket ; Somu, Vijay Bhaskar ; Chottray, Susant ; Saroj, P.C. ; Nagesh, K.V. ; Mittal, K.C. ; Chakravarthy, D.P.

  • Author_Institution
    Accel. & Pulse Power Div., Bhabha Atomic Res. Centre, Mumbai, India
  • Volume
    38
  • Issue
    7
  • fYear
    2010
  • fDate
    7/1/2010 12:00:00 AM
  • Firstpage
    1538
  • Lastpage
    1545
  • Abstract
    The KALI-1000 pulse power system has been used to generate single-pulse nanosecond-duration high-power microwaves from an axial virtual cathode oscillator. The typical electron beam parameters were 250 kV, 15 kA, and 100 ns, with a current density of a few hundreds of amperes per square centimeter. The shot-to-shot variation of the microwave pulsewidth was studied for various anode-cathode gaps and two different cathode materials (velvet and graphite). Results indicated that the average microwave pulsewidth for a diode with a graphite cathode increased as the anode-cathode gap was increased. The one-way analysis of variance was employed to examine the statistical correlation between the diode voltage, current, perveance, and the microwave pulsewidth for various diode gaps and for two different cathode materials. It was shown that the microwave pulsewidth variations are not statistically correlated with the diode voltage, current, and perveance.
  • Keywords
    graphite; pulsed power supplies; statistical analysis; vircators; KALI-1000 pulse power system; anode-cathode gap; axial vircator; axial virtual cathode oscillator; cathode materials; current 15 kA; current density; electron beam parameters; graphite cathode; microwave pulsewidth variation; single pulse nanosecond duration high power microwaves; time 100 ns; voltage 250 V; Electron beam diode; microwave generation; statistical analysis; virtual cathode oscillators (vircators);
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2010.2048581
  • Filename
    5466066