• DocumentCode
    1502397
  • Title

    Time-resolved imaging of anodic arc root behavior during fluctuations of a DC plasma spraying torch

  • Author

    Dorier, Jean-Luc ; Gindrat, Malko ; Hollenstein, Christoph ; Salito, Armando ; Loch, Michael ; Barbezat, Gérard

  • Author_Institution
    EPFL, Centre de recherches en Phys. des Plasmas, Lausanne, Switzerland
  • Volume
    29
  • Issue
    3
  • fYear
    2001
  • fDate
    6/1/2001 12:00:00 AM
  • Firstpage
    494
  • Lastpage
    501
  • Abstract
    The fluctuating behavior of a Sulzer Metco F4 DC plasma gun has been investigated by simultaneous measurement of the time dependencies of the are voltage and of images from the nozzle interior. An end-on imaging arrangement using a mirror and a mask in the optical path from the are to the camera allows visualization of the anodic arc attachment by strongly attenuating the bright emission from the are column. With the torch operating in the restrike mode, sequences of images have been acquired in synchronization with several typical features of the are voltage fluctuations showing that the attachment nature changes during a restrike cycle. Multiple attachments which coexist at least during the 1 μs exposure time of the camera have been evidenced and are interpreted as a continuous process of creation/vanishing of successive arc roots with a smooth transfer of the current from one to the other. The anode wear is shown to have a strong effect on the root position over the anode periphery, with a preference for attachment in eroded regions. The effects of operation parameters such as current, gas flow and injector type on the attachment nature and position are also presented
  • Keywords
    arcs (electric); plasma arc spraying; plasma diagnostics; plasma fluctuations; plasma torches; DC plasma spraying torch; Sulzer Metco F4 DC plasma gun; anodic arc attachment; anodic arc root behavior; creation/vanishing; current; end-on imaging arrangement; fluctuations; gas flow; injector type parameters; mask; mirror; multiple attachments; nozzle interior; operation parameters; optical path; restrike mode; strong effect; time-resolved imaging; voltage fluctuations; Anodes; Cameras; Mirrors; Optical attenuators; Optical imaging; Plasma measurements; Stimulated emission; Time measurement; Visualization; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.928947
  • Filename
    928947