DocumentCode
1507095
Title
A method for the prediction of hot-carrier lifetime in floating SOI NMOSFETs
Author
Maeda, Shigenobu ; Yamaguchi, Yasuo ; Kim, Il-Jung ; Joachim, Hans-Oliver ; Inoue, Yasuo ; Miyoshi, Hirokazu ; Yasuoka, Akihiko
Author_Institution
ULSI Lab., Mitsubishi Electr. Corp., Hyogo, Japan
Volume
44
Issue
12
fYear
1997
fDate
12/1/1997 12:00:00 AM
Firstpage
2200
Lastpage
2206
Abstract
A concept was presented for the prediction of the device lifetimes for the hot-carrier effect (hot-carrier lifetimes) in floating SOI MOSFETs. The concept is that hot-carrier lifetimes in floating SOI MOSFETs can be predicted by estimating the hole current. In order to verify the validity of this concept, the hole current was investigated using device simulation. The results showed that the ratio of the hole current to the drain current in a floating-body SOI MOSFET is approximately equal to the ratio of substrate current to drain current in a body-tied one. Based on this fact, a method for accurately predicting the hot-carrier lifetime in floating-body SOI MOSFETs was proposed. The hot-carrier lifetime predicted with this method agreed well with the experimental results. This study showed that only the drain current difference between floating and body-tied structures results in lifetime differences, and there is no special effect on hot-carrier degradation in floating SOI MOSFETs. In this prediction, therefore, floating SOI MOSFETs can be treated in the same way as bulk MOSFETs. Hot-carrier lifetimes in floating SOI MOSFETs can be predicted using the hole current, while substrate currents are used in bulk MOSFETs
Keywords
MOSFET; carrier lifetime; hot carriers; silicon-on-insulator; Si; device simulation; drain current; floating SOI NMOSFET; floating-body SOI MOSFET; hole current estimation; hot-carrier degradation; hot-carrier lifetime prediction; n-channel MOSFET; substrate current; Bipolar transistors; Degradation; Hot carrier effects; Hot carriers; Laboratories; Life estimation; Lifetime estimation; MOSFET circuits; Silicon on insulator technology; Ultra large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.644636
Filename
644636
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