The magnetic properties and microstructure of strontium ferrite films with perpendicular and in-plane magnetic anisotropy

Author

Acharya, B. Ramamurthy ; Prasad, S. ; Venkataramani, N. ; Ebarra, E.N. ; Suzuki, T.

Author_Institution

Inf. Storage Mater. Lab., Toyota Technol. Inst., Nagoya, Japan

Volume

33

Issue

5

fYear

1997

fDate

9/1/1997 12:00:00 AM

Firstpage

3640

Lastpage

3642

Abstract

The texture and the easy axis of magnetization of strontium ferrite (SrFe₁₂O₁₉) thin films can be controlled by changing the power of the rf sputtering. In-plane magnetic anisotropy is developed at a sputtering power of 330 W (7.5 W/cm²), whereas strong perpendicular magnetic anisotropy (Ku~1×10⁶ erg/cc) is induced at 60 W power (1.3 W/cm²). Further control over coercivity and morphology can be achieved by changing the ratio R, between oxygen and argon in the sputtering gas. Coercivity decreases with R. Films deposited without oxygen exhibit higher coercivity and less intergranular interaction as compared to films sputtered with oxygen

Keywords

coercive force; crystal microstructure; crystal morphology; ferrites; magnetic anisotropy; magnetic thin films; perpendicular magnetic anisotropy; sputter deposition; strontium compounds; texture; 60 to 330 W; SrFe₁₂O₁₉; coercivity; easy axis; in-plane magnetic anisotropy; intergranular interaction; magnetic properties; magnetization; microstructure; morphology; perpendicular magnetic anisotropy; rf sputtering; sputtering power; strong perpendicular magnetic anisotropy; strontium ferrite films; texture; thin films; Coercive force; Ferrites; Magnetic anisotropy; Magnetic properties; Magnetization; Microstructure; Morphology; Perpendicular magnetic anisotropy; Sputtering; Strontium;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.619523

Filename

619523