• DocumentCode
    1512825
  • Title

    Temperature dependence characterization of effective electron and hole mobilities in the accumulation layers of n- and p-type MOSFET´s

  • Author

    Chindalore, G. ; Mudanai, S. ; Shih, W.K. ; Tasch, A.F., Jr. ; Maziar, C.M.

  • Author_Institution
    Microelectron. Res. Center, Texas Univ., Austin, TX, USA
  • Volume
    46
  • Issue
    6
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    1290
  • Lastpage
    1294
  • Abstract
    Experimental results for the MOS electron and hole accumulation layer mobilities (μacc), measured for a wide range of doping concentrations (1×1016 cm-3-4×1017 cm-3) and at temperatures ranging from 25°C to 150°C, indicate a “universal behavior” at high effective fields and over the temperature range of the measurement, similar to that of MOS inversion carriers. At low to moderate transverse fields, μacc is found to be greater than the bulk mobility at lower temperatures, and gradually decreases toward the bulk mobility values with the increasing lattice temperature. However, for lower doping levels, μacc is found to be lower than the bulk mobility values at all temperatures and effective fields
  • Keywords
    MOSFET; accumulation layers; electron mobility; hole mobility; semiconductor device measurement; 25 to 150 C; accumulation layers; doping concentrations; effective electron mobility; effective hole mobility; lattice temperature; n-type MOSFET; p-type MOSFET; temperature dependence characterization; Charge carrier processes; Doping; Electron mobility; Fabrication; Lattices; MOS devices; MOSFET circuits; Microelectronics; Temperature dependence; Temperature distribution;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.766900
  • Filename
    766900