DocumentCode
1512825
Title
Temperature dependence characterization of effective electron and hole mobilities in the accumulation layers of n- and p-type MOSFET´s
Author
Chindalore, G. ; Mudanai, S. ; Shih, W.K. ; Tasch, A.F., Jr. ; Maziar, C.M.
Author_Institution
Microelectron. Res. Center, Texas Univ., Austin, TX, USA
Volume
46
Issue
6
fYear
1999
fDate
6/1/1999 12:00:00 AM
Firstpage
1290
Lastpage
1294
Abstract
Experimental results for the MOS electron and hole accumulation layer mobilities (μacc), measured for a wide range of doping concentrations (1×1016 cm-3-4×1017 cm-3) and at temperatures ranging from 25°C to 150°C, indicate a “universal behavior” at high effective fields and over the temperature range of the measurement, similar to that of MOS inversion carriers. At low to moderate transverse fields, μacc is found to be greater than the bulk mobility at lower temperatures, and gradually decreases toward the bulk mobility values with the increasing lattice temperature. However, for lower doping levels, μacc is found to be lower than the bulk mobility values at all temperatures and effective fields
Keywords
MOSFET; accumulation layers; electron mobility; hole mobility; semiconductor device measurement; 25 to 150 C; accumulation layers; doping concentrations; effective electron mobility; effective hole mobility; lattice temperature; n-type MOSFET; p-type MOSFET; temperature dependence characterization; Charge carrier processes; Doping; Electron mobility; Fabrication; Lattices; MOS devices; MOSFET circuits; Microelectronics; Temperature dependence; Temperature distribution;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.766900
Filename
766900
Link To Document