• DocumentCode
    1513866
  • Title

    Three-dimensional self-consistent simulation of silicon quantum-dot floating-gate flash memory device

  • Author

    Thean, A. ; Leburton, J.P.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
  • Volume
    20
  • Issue
    6
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    286
  • Lastpage
    288
  • Abstract
    We report on the simulation of single-electron charging operation of a silicon quantum-dot memory device using the self-consistent solutions of the Schrodinger and Poisson equations. We focus on the effects of the poly-wrapped gate on the onset of inversion. We show that the geometry of the control gate causes the inversion to occur on the vertical sides of the channel. The device experiences a strongly nonuniform threshold voltage shift as a function of the number of electrons in the dot to reach about 0.5 V when the floating gate quantum-dot is charged from empty to ten electrons.
  • Keywords
    Poisson equation; Schrodinger equation; elemental semiconductors; flash memories; quantum well devices; semiconductor device models; semiconductor quantum dots; semiconductor storage; silicon; Poisson equation; Schrodinger equation; Si; carrier inversion; poly-wrapped gate; silicon quantum-dot floating-gate flash memory device; single-electron charging; three-dimensional self-consistent simulation; threshold voltage; Charge carrier processes; Effective mass; Electrons; Fabrication; Finite difference methods; Flash memory; Nonvolatile memory; Poisson equations; Quantum dots; Silicon on insulator technology;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/55.767100
  • Filename
    767100