• DocumentCode
    1520611
  • Title

    Size-Dependent-Transport Study of \\hbox {In}_{0.53} \\hbox {Ga}_{0.47}\\hbox {As} Gate-All-Around Nanowire MOSFETs: Impact of Quantum Confinement and Volume Inversion

  • Author

    Gu, Jiangjiang J. ; Wu, Heng ; Liu, Yiqun ; Neal, Adam T. ; Gordon, Roy G. ; Ye, Peide D.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • Volume
    33
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    967
  • Lastpage
    969
  • Abstract
    InGaAs gate-all-around nanowire MOSFETs with channel length down to 50 nm have been experimentally demonstrated by a top-down approach. The nanowire size-dependent transport properties have been systematically investigated. It is found that reducing nanowire dimension leads to higher on-current, transconductance, and effective mobility due to stronger quantum confinement and the volume-inversion effect. TCAD quantum mechanical simulation has been carried out to study the inversion charge distribution inside the nanowires. Volume-inversion effect appears at a larger dimension for InGaAs nanowire MOSFET than its Si counterpart.
  • Keywords
    III-V semiconductors; MOSFET; gallium arsenide; nanoelectronics; nanowires; In0.53Ga0.47As; TCAD quantum mechanical simulation; channel length; gate-all-around nanowire MOSFET; inversion charge distribution; nanowire size-dependent transport property; quantum confinement; size 50 nm; top-down approach; transconductance; volume inversion effect; Fabrication; Indium gallium arsenide; Logic gates; MOSFETs; Nanobioscience; Nanoscale devices; Silicon; Gate-all-around (GAA); InGaAs; nanowire;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2194690
  • Filename
    6203360