DocumentCode
1525277
Title
Microfabricated silicon solid immersion lens
Author
Fletcher, Daniel A. ; Crozier, Kenneth B. ; Guarini, Kathryn W. ; Minne, Stephen C. ; Kino, Gordon S. ; Quate, Calvin F. ; Goodson, Kenneth E.
Author_Institution
Edward L. Ginzton Lab., Stanford Univ., CA, USA
Volume
10
Issue
3
fYear
2001
fDate
9/1/2001 12:00:00 AM
Firstpage
450
Lastpage
459
Abstract
We present the microfabrication of a solid immersion lens from silicon for scanning near-field optical microscopy. The solid immersion lens (SIL) achieves spatial resolution better than the diffraction limit in air without the losses associated with tapered optical fibers. A 15-μm-diameter SIL is formed by reflowing photoresist in acetone vapor and transferring the shape into single-crystal Si with reactive ion etching. The lens is integrated onto a cantilever for scanning, and a tip is fabricated opposite the lens to localize lens-sample contact. Using the Si SIL, we show that microfabricrated lenses have greater optical transparency and less aberration than conventional lenses by focusing a plane wave of 633-nm light to a spot close to a wavelength in diameter. Microlenses made from absorbing materials can be used when the lens thickness Is comparable to the penetration depth of the light. Tolerance to errors in curvature and thickness is improved in micromachined lenses, because spherical aberrations decrease with lens diameter. We demonstrate scanning near-field optical microscopy with the Si SIL and achieve spatial resolution below the diffraction limit in air by resolving 200-nm lines with 633-nm light
Keywords
aberrations; elemental semiconductors; microlenses; near-field scanning optical microscopy; photoresists; silicon; sputter etching; 15 micron; 633 nm; Si; cantilever; lens diameter; lens-sample contact; microfabrication; microlenses; optical transparency; penetration depth; photoresist; reactive ion etching; scanning near-field optical microscopy; solid immersion lens; spatial resolution; spherical aberrations; Lenses; Optical diffraction; Optical fiber losses; Optical fibers; Optical microscopy; Particle beam optics; Resists; Silicon; Solids; Spatial resolution;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/84.946806
Filename
946806
Link To Document