DocumentCode
1527640
Title
Efficiency enhancement in high power backward-wave oscillators
Author
Goebel, Dan M. ; Adler, E.A. ; Ponti, Elmira S. ; Feicht, J.R. ; Eisenhart, Robert L. ; Lemke, Raymond W.
Author_Institution
Hughes Electron Dynamics, Torrance, CA, USA
Volume
27
Issue
3
fYear
1999
fDate
6/1/1999 12:00:00 AM
Firstpage
800
Lastpage
809
Abstract
High power microwave (HPM) sources based on the backward-wave oscillator (BWO) have been investigated for the past two decades primarily because of their potential for very high efficiency (15 to 40%) operation. Several different effects have been proposed to explain this high efficiency compared to conventional BWOs. One of the major contributors to the high efficiency of the plasma-filled Pasotron HPM BWO source is the presence of optimally phased end reflections. The Pasotron uses a long-pulse (⩾100 μs) plasma-cathode electron-gun and plasma filled slow-wave structure to produce microwave pulses in the range of 1 to 10 MW without the use of externally produced magnetic fields. The efficiency of the Pasotron can be enhanced by up to a factor of two when the device is configured as a standing-wave oscillator in which properly phased reflections from the downstream collector end of the finite length SWS constructively interfere with the fundamental backward-wave modes and improve the coupling of the beam to the circuit. Operation in this configuration increases the efficiency up to 30% but causes the frequency to vary in discrete steps and the output power to change strongly with beam parameters and oscillation frequency
Keywords
backward wave oscillators; magnetic fields; plasma filled waveguides; backward-wave modes; beam parameters; beam-circuit coupling; constructive interference; downstream collector end; efficiency enhancement; high power backward-wave oscillators; high power microwave sources; long-pulse plasma-cathode electron-gun; microwave pulses; optimally phased end reflections; oscillation frequency; output power; phased reflections; plasma filled slow-wave structure; plasma-filled Pasotron; standing-wave oscillator; Coupling circuits; Frequency; Magnetic fields; Microwave devices; Microwave oscillators; Optical coupling; Optical reflection; Plasma devices; Plasma sources; Power generation;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.774686
Filename
774686
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