DocumentCode
1528694
Title
Modeling of high-pressure, high-frequency (RF) oxygen plasmas
Author
Or, David Tsuenwai ; Subramanian, N.S. ; Heberlein, Joachim V R ; Pfender, Emil
Author_Institution
Appl. Mater. Inc., Santa Clara, CA, USA
Volume
25
Issue
5
fYear
1997
fDate
10/1/1997 12:00:00 AM
Firstpage
1034
Lastpage
1041
Abstract
A numerical model has been developed to simulate oxygen high-frequency (RF) plasmas at pressures of 1 and 5 atm. In contrast to argon plasmas at 1 atm, oxygen plasmas separate from the walls of the reactor tube and concentrate more toward the center of the tube. This effect is even more pronounced at 5 atm. As the power dissipation in the plasma increases, the plasma volume also increases, both radially and axially, without significant increase of the maximum temperature. Insertion of a water-cooled injection probe along the center of the reactor tube causes severe quenching of the oxygen plasma in contrast to argon plasmas which are insensitive to such probes. This indicates that injection of reactants into RF oxygen plasmas by means of water-cooled probes imposes problems due to the sensitivity of oxygen plasma to the presence and location of the probe in the plasma
Keywords
oxygen; plasma flow; plasma probes; plasma simulation; plasma temperature; plasma torches; plasma turbulence; quenching (thermal); 1 atm; 5 atm; O2; O2 plasma; high-frequency plasma; high-pressure plasma; maximum temperature; numerical model; plasma; plasma volume; power dissipation; probe location; probe presence; quenching; reactor tube; sensitivity; water-cooled injection; water-cooled probes; Argon; Equations; Inductors; Oxygen; Plasma applications; Plasma simulation; Plasma temperature; Probes; Radio frequency; Thermal spraying;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.649623
Filename
649623
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