Epitaxial Co/sub 80/Pt/sub 20/ films with in-plane uniaxial anisotropy

Author

Xu, B. ; Du, J. ; Klemmer, T.J. ; Schad, R. ; Barnard, J.A. ; Doyle, W.D.

Author_Institution

Dept. of Phys. & Astron., Alabama Univ., Tuscaloosa, AL, USA

Volume

37

Issue

4

fYear

2001

fDate

7/1/2001 12:00:00 AM

Firstpage

1512

Lastpage

1514

Abstract

Uniaxial Co₈₀Pt₂₀ epitaxial films with in-plane anisotropy were prepared by dc sputter deposition using W/Ag templates on H-terminated Si(110) substrates. The epitaxial relationship as a function of the CoPt thickness, studied by electron and X-ray diffraction, is complex for CoPt thickness < 5 nm. For CoPt thickness > 5 nm, the epitaxial relationship was found to be CoPt(1010)[0001] || W(112)[110] || Ag(110)[001]|| Si(110)[001]. Anisotropy constants were measured using in-plane torque curves and the initial magnetization curves along the hard axis. For 10 to 20 nm thick Co₈₀Pt₂₀, Κ1 was found to be ~ 9 × 10⁶ erg/cc and Κ2 was negligible.

Keywords

X-ray diffraction; cobalt alloys; electron diffraction; ferromagnetic materials; magnetic anisotropy; magnetic epitaxial layers; magnetic hysteresis; magnetic recording; mosaic structure; platinum alloys; sputter deposition; sputtered coatings; torque; transmission electron microscopy; Co/sub 80/Pt/sub 20/; DC sputter deposition; Si; TEM; W/Ag templates; X-ray diffraction; anisotropy constants; electron diffraction; epitaxial films; epitaxial relationship; film morphology; hard axis; hysteresis loops; in-plane torque curves; in-plane uniaxial anisotropy; initial magnetization curves; strain effect; thickness dependence; Anisotropic magnetoresistance; Electrons; Extraterrestrial measurements; Lattices; Magnetic anisotropy; Magnetic films; Sputtering; Substrates; Torque measurement; X-ray diffraction;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.950886

Filename

950886