• DocumentCode
    1533902
  • Title

    Estimating and controlling atomic chlorine concentration via actinometry

  • Author

    Hanish, Courtney K. ; Grizzle, Jessy W. ; Teny, F.L.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
  • Volume
    12
  • Issue
    3
  • fYear
    1999
  • fDate
    8/1/1999 12:00:00 AM
  • Firstpage
    323
  • Lastpage
    331
  • Abstract
    Actinometry has been used as the basis of a successful sensor for controlling fluorine concentration in fluorocarbon plasmas commonly employed in etching. An analogous sensor would be useful for chlorine plasmas as well. One problem with actinometry in Cl2 plasmas is that excitation can occur by electron impact dissociation and by dissociative attachment, leading to potential ambiguity between the intensity of observed chlorine emission in a plasma and the actual concentration of chlorine. On the basis of a simple model, this paper analyzes the consequences of the dissociative excitation pathway on the accuracy of the estimation and control of chlorine concentration via actinometry. When the contribution of the dissociative excitation pathway is known, it is shown that asymptotic observer theory can be used to improve the accuracy of the estimation of chlorine concentration
  • Keywords
    chemical variables measurement; electron attachment; electron impact dissociation; radiometry; sputter etching; actinometry; asymptotic observer theory; atomic chlorine concentration; dissociative attachment; dissociative excitation pathway; electron impact dissociation; plasma etching; Atomic beams; Atomic measurements; Control systems; Dry etching; Gas lasers; Plasma applications; Plasma materials processing; Plasma measurements; Plasma temperature; Sputter etching;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/66.778197
  • Filename
    778197