DocumentCode
1533902
Title
Estimating and controlling atomic chlorine concentration via actinometry
Author
Hanish, Courtney K. ; Grizzle, Jessy W. ; Teny, F.L.
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
Volume
12
Issue
3
fYear
1999
fDate
8/1/1999 12:00:00 AM
Firstpage
323
Lastpage
331
Abstract
Actinometry has been used as the basis of a successful sensor for controlling fluorine concentration in fluorocarbon plasmas commonly employed in etching. An analogous sensor would be useful for chlorine plasmas as well. One problem with actinometry in Cl2 plasmas is that excitation can occur by electron impact dissociation and by dissociative attachment, leading to potential ambiguity between the intensity of observed chlorine emission in a plasma and the actual concentration of chlorine. On the basis of a simple model, this paper analyzes the consequences of the dissociative excitation pathway on the accuracy of the estimation and control of chlorine concentration via actinometry. When the contribution of the dissociative excitation pathway is known, it is shown that asymptotic observer theory can be used to improve the accuracy of the estimation of chlorine concentration
Keywords
chemical variables measurement; electron attachment; electron impact dissociation; radiometry; sputter etching; actinometry; asymptotic observer theory; atomic chlorine concentration; dissociative attachment; dissociative excitation pathway; electron impact dissociation; plasma etching; Atomic beams; Atomic measurements; Control systems; Dry etching; Gas lasers; Plasma applications; Plasma materials processing; Plasma measurements; Plasma temperature; Sputter etching;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.778197
Filename
778197
Link To Document