• DocumentCode
    1534681
  • Title

    InAlN/AlN/GaN HEMTs With Regrown Ohmic Contacts and f_{T} of 370 GHz

  • Author

    Yue, Yuanzheng ; Hu, Zongyang ; Guo, Jia ; Sensale-Rodriguez, Berardi ; Li, Guowang ; Wang, Ronghua ; Faria, Faiza ; Fang, Tian ; Song, Bo ; Gao, Xiang ; Guo, Shiping ; Kosel, Thomas ; Snider, Gregory ; Fay, Patrick ; Jena, Debdeep ; Xing, Huili

  • Author_Institution
    Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
  • Volume
    33
  • Issue
    7
  • fYear
    2012
  • fDate
    7/1/2012 12:00:00 AM
  • Firstpage
    988
  • Lastpage
    990
  • Abstract
    We report 30-nm-gate-length InAlN/AlN/GaN/SiC high-electron-mobility transistors (HEMTs) with a record current gain cutoff frequency (fT) of 370 GHz. The HEMT without back barrier exhibits an extrinsic transconductance (gm.ext) of 650 mS/mm and an on/off current ratio of 106 owing to the incorporation of dielectric-free passivation and regrown ohmic contacts with a contact resistance of 0.16 Ω·mm. Delay analysis suggests that the high fT is a result of low gate-drain parasitics associated with the rectangular gate. Although it appears possible to reach 500-GHz fT by further reducing the gate length, it is imperative to investigate alternative structures that offer higher mobility/velocity while keeping the best possible electrostatic control in ultrascaled geometry.
  • Keywords
    III-V semiconductors; aluminium compounds; contact resistance; gallium compounds; high electron mobility transistors; indium compounds; ohmic contacts; wide band gap semiconductors; HEMT; InAlN-AlN-GaN-SiC; contact resistance; delay analysis; dielectric-free passivation; electrostatic control; extrinsic transconductance; frequency 370 GHz; gate length reduction; high-electron-mobility transistors; low gate-drain parasitics; rectangular gate; regrown ohmic contacts; size 30 nm; ultrascaled geometry; Delay; Gallium nitride; HEMTs; Logic gates; MODFETs; Ohmic contacts; $f_{T}$; AlN; GaN; InAlN; cutoff frequency; high-electron-mobility transistor (HEMT); molecular beam epitaxy (MBE); regrown ohmic contacts; transistor;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2012.2196751
  • Filename
    6213496