DocumentCode
1535806
Title
High reflectivity Te-doped GaAsSb/AlAsSb Bragg mirror for 1.5 μm surface emitting lasers
Author
Genty, F. ; Almuneau, G. ; Chusseau, L. ; Boissier, G. ; Malzac, J.-P. ; Salet, P. ; Jacquet, J.
Author_Institution
Centre d´´Electron. et de Micro-Optoelectronique, Univ. des Sci. et Tech. du Languedoc, Montpellier, France
Volume
33
Issue
2
fYear
1997
fDate
1/16/1997 12:00:00 AM
Firstpage
140
Lastpage
142
Abstract
A high reflectivity GaAsSb/AlAsSb Bragg mirror lattice matched to InP is reported. Operation at 1.5 μm is obtained owing to a large Burstein-Moss shift of GaAsSb absorption caused by a strong N-doping up to 1019 cm-2. Peak reflectivity up to 94% has been measured with only 11.5 periods
Keywords
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium arsenide; laser cavity resonators; laser mirrors; laser transitions; reflectivity; semiconductor lasers; surface emitting lasers; tellurium; 1.5 micron; AlAsSb-GaAsSb:Te,N-InP; Bragg mirror; Burstein-Moss shift; GaAsSb absorption; Te doping; VCSEL; high reflectivity mirror; lattice match; strong N doping; surface emitting lasers; vertical cavity SEL;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19970112
Filename
579438
Link To Document