Molecular beam epitaxy growth of TmP/GaAs and transistor action in GaP/TmP/GaAs heterostructures

The growth of thulium phosphide (TmP) by molecular beam epitaxy (MBE) on GaAs substrate is reported. Good epilayer quality was demonstrated through X-ray diffraction (XRD), atomic force microscopy (AFM) and transmission electron microscopy (TEM) analysis. The closely lattice matched TmP layer was n-type with an electron concentration of 1.6×10²¹ cm^-3 and a room temperature mobility of 4.8 cm²V^-1s^-1. The Schottky barrier height determined from 1/capacitance² (1/C²) versus voltage (V) measurements is about 0.81 eV which agrees well with the value obtained through the current-voltage (I-V) measurements. In this work, we also report transistor action in a GaP/TmP/GaAs structure, for which chemical bonding techniques were employed. From I-V measurements, a common base current gain α≈0.55 at V_CB=0 was obtained at room temperature