DocumentCode
1538574
Title
Physical and theoretical aspects of a new vacuum arc control technology-self arc diffusion by electrode: SADE
Author
Homma, Mitsutaka ; Somei, Hiromich ; Niwa, Yoshimitsu ; Yokokura, Kunio ; Ohshima, Iwao
Author_Institution
Toshiba Corp., Tokyo, Japan
Volume
27
Issue
4
fYear
1999
fDate
8/1/1999 12:00:00 AM
Firstpage
961
Lastpage
968
Abstract
Our new vacuum arc control technology SADE doubles the high current interruption capability of our conventional axial magnetic field technology. First, we describe the vacuum arc motion behavior recorded by a high speed charge-coupled device video camera. This arc behavior is closely related to axial magnetic field intensity. In particular, it depends on the profile of the externally generated axial magnetic field. The anode spot is likely to move to the highest magnetic field intensity. Second, we describe analytical results for concentration of vacuum arc at the anode side contact surface. This analysis implies the possibility of an ideal magnetic field profile and intensity for vacuum arc control. Finally, we describe experimental results for vacuum arc control compared with the physical and theoretical results mentioned above, and we show a practical electrode configuration for vacuum interrupters and its application in a high current interruption experiment
Keywords
diffusion; electrodes; plasma transport processes; plasma-wall interactions; vacuum arcs; vacuum interrupters; 0.00 to 0.80 T; SADE; anode side contact surface; anode spot; axial magnetic field intensity; axial magnetic field technology; electrode configuration; high current interruption capability; high current interruption experiment; high speed charge-coupled device video camera; ideal magnetic field profile; magnetic flux distribution analysis; radial position; self arc diffusion by electrode; vacuum arc control technology; vacuum arc motion; vacuum interrupters; Anodes; Electrodes; Interrupters; Magnetic analysis; Magnetic fields; Magnetic flux density; Research and development; Vacuum arcs; Vacuum systems; Vacuum technology;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.782267
Filename
782267
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