• DocumentCode
    1538783
  • Title

    Sensitivity enhancement in lateral capacitive accelerometers by structure width optimisation

  • Author

    Ramos, J.

  • Author_Institution
    Centro Nacional de Microelectronica, Seville, Spain
  • Volume
    33
  • Issue
    5
  • fYear
    1997
  • fDate
    2/27/1997 12:00:00 AM
  • Firstpage
    384
  • Lastpage
    386
  • Abstract
    An optimum assignment is found for the distribution of area in surface micromachined lateral capacitive accelerometers between stationary and moving electrodes to improve the S/N ratio of the sensor. Depending on etching hole geometry, the sensitivity can increase by a factor of up to 1.76
  • Keywords
    accelerometers; capacitance; micromachining; microsensors; optimisation; sensitivity analysis; S/N ratio; SNR improvement; area distribution; etching hole geometry; lateral capacitive accelerometers; micromachined accelerometers; moving electrodes; optimum assignment; sensitivity enhancement; stationary electrodes; structure width optimisation;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19970256
  • Filename
    581037
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1538783