DocumentCode
1540340
Title
Stitching-error reduction in gratings by shot-shifted electron-beam lithography
Author
Dougherty, David J. ; Muller, Richard E. ; Maker, Paul D. ; Forouhar, Siamak
Author_Institution
Scion Photonics, Milpitas, CA, USA
Volume
19
Issue
10
fYear
2001
fDate
10/1/2001 12:00:00 AM
Firstpage
1527
Lastpage
1531
Abstract
Calculations of the grating spatial-frequency spectrum and the filtering properties of multiple-pass electron-beam writing demonstrate a tradeoff between stitching-error suppression and minimum pitch separation. High-resolution measurements of optical-diffraction patterns show a 25-dB reduction in stitching-error side modes
Keywords
diffraction gratings; electron beam lithography; integrated optics; filtering properties; grating spatial-frequency spectrum; gratings; high-resolution measurements; minimum pitch separation; multiple-pass electron-beam writing; optical-diffraction patterns; shot-shifted electron-beam lithography; stitching-error reduction; stitching-error side modes; stitching-error suppression; Distributed feedback devices; Gratings; Laboratories; Laser feedback; Laser modes; Lithography; Optical feedback; Optical filters; Semiconductor lasers; Writing;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/50.956140
Filename
956140
Link To Document