• DocumentCode
    1542113
  • Title

    Properties of high-T/sub c/ ramp-edge junctions with a Ga-doped YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// barrier

  • Author

    I-Hun Song ; Eun-Hong Lee ; Insang Song ; Gwangseo Park

  • Author_Institution
    Electron. Mater. Lab., Samsung Adv. Inst. of Technol., Suwon, South Korea
  • Volume
    9
  • Issue
    2
  • fYear
    1999
  • fDate
    6/1/1999 12:00:00 AM
  • Firstpage
    3137
  • Lastpage
    3140
  • Abstract
    We have fabricated high-T/sub c/ ramp-edge junctions with a Ga-doped YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// (YBCO) barrier in the trilayer geometry of YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta///YBa/sub 2/Cu/sub 2.79/Ga/sub 0.21/O/sub 7-/spl delta///YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// on LaAlO/sub 3/ single crystals. Interface resistances of the junctions were drastically reduced by using in-situ RF plasma cleaning treatment. The cross-sectional images of the interface of the junctions were analyzed by high resolution transmission electron microscopy. The temperature dependences of critical currents and junction resistances were consistent with the behavior predicted by the conventional proximity effect. The critical currents of the Ga-doped junctions were less sensitive to the variation of the barrier thickness compared to those of the other junctions. The increase of the barrier resistivity by Ga-doping resulted in an enhancement of the I/sub c/R/sub n/ values, up to 320 /spl mu/V at 60 K.
  • Keywords
    Josephson effect; barium compounds; high-temperature superconductors; proximity effect (superconductivity); superconductor-normal-superconductor devices; yttrium compounds; 60 K; Ga-doped YBa/sub 2/Cu/sub 3/O/sub 7-/spl delta// barrier; LaAlO/sub 3/ single crystal substrate; RF plasma cleaning; YBCO trilayer structure; YBa/sub 2/Cu/sub 2.79/Ga/sub 0.21/O/sub 7/; YBa/sub 2/Cu/sub 3/O/sub 7/; critical current; cross-sectional imaging; high-T/sub c/ superconductor; interface resistance; proximity effect; ramp-edge Josephson junction; temperature dependence; transmission electron microscopy; Cleaning; Critical current; Crystals; Electrons; Geometry; Image analysis; Image resolution; Plasma temperature; Radio frequency; Yttrium barium copper oxide;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/77.783694
  • Filename
    783694