Threshold voltage dependence of LOCOS-isolated thin-film SOI NMOSFET on buried oxide thickness

Effects of buried oxide thickness on short-channel effect of LOCOS-isolated thin-film SOI n-MOSFETs have been investigated. Devices fabricated on SOI substrate with thin (100 nm) buried oxide have smaller roll-off of threshold voltage than those fabricated on SOI substrate with thick (400 nm) buried oxide. This is caused by a different boron concentration at the silicon film that results from the difference of stress with the buried oxide thickness. In the case of thin buried oxide, higher volumetric expansion of the field oxide causes higher stress at the interface between the silicon film and the surrounding oxide, including field and buried oxide, which prevents boron atoms from diffusing beyond the interface.