• DocumentCode
    1547781
  • Title

    Lateral field emission diodes using SIMOX wafer

  • Author

    Park, Jung-Hyeon ; Lee, Hyung-Il ; Tae, Heung-Sik ; Huh, Jeung-Soo ; Lee, Jung-Hee

  • Author_Institution
    Sch. of Electr. Eng., Kyungpook Nat. Univ., Taegu, South Korea
  • Volume
    44
  • Issue
    6
  • fYear
    1997
  • fDate
    6/1/1997 12:00:00 AM
  • Firstpage
    1018
  • Lastpage
    1021
  • Abstract
    Lateral field emission diodes were fabricated by using separation by implantation of oxygen (SIMOX) wafer and their current-voltage characteristics (I-V) were analyzed. Applying conventional photolithography and local oxidation of silicon (LOGOS) process, we fabricated single-crystalline lateral silicon field emitters with very sharp cathode and anode tips and very short cathode to anode spacing ranging from 0.3 to 0.8 μm as well. Two different types of tips, tapered and wedge-shaped emitters, were typically formed according to oxidation time. The turn-on voltages for both types of diodes were as low as 22~25 V and the emission currents were as high as 6 μA/tip at voltages of 35~38 V. From the Fowler-Nordheim (FN) equation, field emitting area (A) and field enhancement factor (β) for both types of diodes were estimated to explain the low turn-on voltages and the high emission currents
  • Keywords
    SIMOX; diodes; electron field emission; elemental semiconductors; oxidation; photolithography; silicon; vacuum microelectronics; 0.3 to 0.8 micron; 22 to 25 V; 35 to 38 V; Fowler-Nordheim equation; I-V characteristics; LOGOS process; SIMOX wafer; Si; anode tips; cathode tips; current-voltage characteristics; emission currents; fabrication; field emitting area; field enhancement factor; lateral Si field emitters; lateral field emission diodes; local oxidation; oxidation time; photolithography; tapered emitters; turn-on voltages; wedge-shaped emitters; Anodes; Cathodes; Diodes; Electrodes; Fabrication; Lithography; Oxidation; Silicon; Tungsten; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.585560
  • Filename
    585560