DocumentCode
1549063
Title
Early history of vacuum arc deposition
Author
Boxman, Raymond L.
Author_Institution
Fleischman Fac. of Eng., Tel Aviv Univ., Israel
Volume
29
Issue
5
fYear
2001
fDate
10/1/2001 12:00:00 AM
Firstpage
759
Lastpage
761
Abstract
Vacuum arc deposition (VAD) was first investigated at the end of the 19th century by A. W. Wright and T. A. Edison, as mirror coatings and seed layers for phonogram replication molds, respectively. The early research anticipated later developments, including cathode shielding, multi-layer coatings, substrate motion, and hybrid processing
Keywords
history; vacuum arcs; vacuum deposition; Arthur W. Wright; Thomas A. Edison; cathode shielding; duplication; high current electrical discharge; history; hybrid processing; mirror coatings; multi-layer coatings; phonogram replication molds; phonograms; seed layers; substrate´ motion; thin films; vacuum arc deposition; Cathodes; Coatings; Electrodes; Electron tubes; Glass; Helium; History; Switches; Transistors; Vacuum arcs;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.964470
Filename
964470
Link To Document