• DocumentCode
    1549066
  • Title

    Recent developments in vacuum arc deposition

  • Author

    Boxman, Raymond L.

  • Author_Institution
    Fleischman Fac. of Eng., Tel Aviv Univ., Israel
  • Volume
    29
  • Issue
    5
  • fYear
    2001
  • fDate
    10/1/2001 12:00:00 AM
  • Firstpage
    762
  • Lastpage
    767
  • Abstract
    Vacuum arc deposition (VAD) has become an established industrial art for producing hard, wear-resistant and decorative coatings. Sophisticated coatings, including tertiary compounds and multilayers, are increasingly used. Filtered VAD and hot electrode vacuum arcs are increasingly investigated to obtain high-quality, macroparticle-free films. Improved filtered sources, including large rectangular filters, have been demonstrated. Besides tool coatings, films for metallizing integrated circuits and protecting magnetic media are being developed
  • Keywords
    reviews; vacuum arcs; vacuum deposition; cathodic arc; decorative coatings; filtered sources; filtered vacuum arc deposition; hard coatings; hot electrode vacuum arcs; industrial art; integrated circuits; large rectangular filters; macroparticle-free films; magnetic media; metallizing; multilayers; protective coatings; tertiary compounds; thin films; tool coatings; wear-resistant coatings; Art; Coatings; Electrodes; Filters; Integrated circuit metallization; Magnetic films; Magnetic multilayers; Magnetic separation; Protection; Vacuum arcs;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.964471
  • Filename
    964471