DocumentCode
1549918
Title
Implicit Continuous Current–Voltage Model for Surrounding-Gate Metal–Oxide–Semiconductor Field-Effect Transistors Including Interface Traps
Author
Yu, Yun Seop ; Cho, NamKi ; Hwang, Sung Woo ; Ahn, Doyeol
Author_Institution
Dept. of Inf. & Control Eng., Hankyong Nat. Univ., Anseong, South Korea
Volume
58
Issue
8
fYear
2011
Firstpage
2520
Lastpage
2524
Abstract
An analytic and continuous direct-current model for cylindrical doped surrounding-gate metal-oxide-semiconductor field-effect transistors (SGMOSFETs) including interface-trap charges is presented. Based on the SGMOSFET model, which is valid from undoped to heavily doped channels, a general model for long-channel SGMOSFETs including interface-trap charges is derived. A comparison between the numerical simulations and analytic calculations showed that the proposed model is valid for all operating regions of SGMOSFETs including different interface-trap charges with several dimensions and doping densities.
Keywords
MOSFET; interface states; numerical analysis; semiconductor device models; SGMOSFET model; continuous current-voltage model; doping densities; interface-trap charges; numerical simulations; surrounding-gate metal-oxide-semiconductor field-effect transistors; Analytical models; Electron devices; Logic gates; Numerical models; Numerical simulation; Semiconductor process modeling; Silicon; Interface trap; SPICE; surrounding-gate metal–oxide–semiconductor field-effect transistor (SGMOSFET);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2011.2156412
Filename
5871314
Link To Document