• DocumentCode
    1556670
  • Title

    Space- and surface-charge behavior analysis of plasma-preprocessed dielectric thin films

  • Author

    Takashima, Kazunori ; Oda, Tetsuji

  • Author_Institution
    Dept. of Electr. Eng., Tokyo Univ., Japan
  • Volume
    35
  • Issue
    5
  • fYear
    1999
  • Firstpage
    1192
  • Lastpage
    1197
  • Abstract
    In order to study the space-charge behavior in dielectric thin films, a space-charge distribution measuring system based on a laser-induced pressure pulse (LIPP) method was constructed. The pressure pulse was generated by irradiating the absorbent on a sample surface with a mode-locked picosecond YAG laser to achieve good spatial resolution. From a LIPP response of a polyvinylidene fluoride piezoelectric thin film, an in-depth profile of the system is estimated. For example, it was estimated to be about 2 μm for polytetrafluoroethylene (PTFE) thin film. By using the space-charge density distribution measurement, space- and surface-charge behavior of the corona-charged PTFE thin film was studied. The effect of the antistatic process using low-pressure discharge plasma and a charge-elimination process by dipping in city water was also studied. Plasma processing enhances the effect of charge elimination by dipping in city water
  • Keywords
    dielectric thin films; measurement by laser beam; organic insulating materials; plasma materials processing; polymers; space charge; surface charging; PTFE thin film; antistatic process; charge-elimination process; city water dipping; laser-induced pressure pulse LIPP method; low-pressure discharge plasma; mode-locked picosecond YAG laser; plasma-preprocessed dielectric thin films; polyvinylidene fluoride piezoelectric thin film; space-charge behavior analysis; space-charge density distribution measurement; space-charge distribution measuring system; surface-charge behavior analysis; Cities and towns; Dielectric measurements; Dielectric thin films; Laser mode locking; Optical pulse generation; Piezoelectric films; Plasma density; Plasma materials processing; Plasma measurements; Pulse measurements;
  • fLanguage
    English
  • Journal_Title
    Industry Applications, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-9994
  • Type

    jour

  • DOI
    10.1109/28.793384
  • Filename
    793384