DocumentCode
1557758
Title
MOSFET subthreshold compact modeling with effective gate overdrive
Author
Lim, Khee Yong ; Zhou, Xing
Author_Institution
Chartered Semicond. Manuf. Ltd, Singapore, Singapore
Volume
49
Issue
1
fYear
2002
fDate
1/1/2002 12:00:00 AM
Firstpage
196
Lastpage
199
Abstract
In this work, a previously-proposed one-region MOSFET drain current (Id.) model is improved in the subthreshold modeling. The compact model is derived based on a first-principle drift-diffusion formulation with the correct drift and diffusion currents in strong inversion and subthreshold, respectively. The new model has only one fitting parameter for subthreshold slope and can ensure excellent continuity with smooth transition from subthreshold to strong-inversion regimes, including the moderate-inversion region of growing importance for low-voltage and low-power circuits
Keywords
MOSFET; diffusion; semiconductor device models; MOSFET drain current model; MOSFET subthreshold compact modeling; deep-submicron MOSFETs; drift-diffusion formulation; effective gate overdrive; fitting parameter; moderate-inversion region; strong inversion; subthreshold slope; unified one-region drain current model; Circuit simulation; FETs; Fitting; MOSFET circuits; Manufacturing industries; Physics; Semiconductor device manufacture; Smoothing methods; Threshold voltage; Ultra large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.974771
Filename
974771
Link To Document