• DocumentCode
    1557758
  • Title

    MOSFET subthreshold compact modeling with effective gate overdrive

  • Author

    Lim, Khee Yong ; Zhou, Xing

  • Author_Institution
    Chartered Semicond. Manuf. Ltd, Singapore, Singapore
  • Volume
    49
  • Issue
    1
  • fYear
    2002
  • fDate
    1/1/2002 12:00:00 AM
  • Firstpage
    196
  • Lastpage
    199
  • Abstract
    In this work, a previously-proposed one-region MOSFET drain current (Id.) model is improved in the subthreshold modeling. The compact model is derived based on a first-principle drift-diffusion formulation with the correct drift and diffusion currents in strong inversion and subthreshold, respectively. The new model has only one fitting parameter for subthreshold slope and can ensure excellent continuity with smooth transition from subthreshold to strong-inversion regimes, including the moderate-inversion region of growing importance for low-voltage and low-power circuits
  • Keywords
    MOSFET; diffusion; semiconductor device models; MOSFET drain current model; MOSFET subthreshold compact modeling; deep-submicron MOSFETs; drift-diffusion formulation; effective gate overdrive; fitting parameter; moderate-inversion region; strong inversion; subthreshold slope; unified one-region drain current model; Circuit simulation; FETs; Fitting; MOSFET circuits; Manufacturing industries; Physics; Semiconductor device manufacture; Smoothing methods; Threshold voltage; Ultra large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.974771
  • Filename
    974771