DocumentCode
1560440
Title
Modeling of single-event effects in circuit-hardened high-speed SiGe HBT logic
Author
Niu, Guofu ; Krithivasan, Ramkumar ; Cressler, John D. ; Marshall, Paul ; Marshall, Cheryl ; Reed, Robert ; Harame, David L.
Author_Institution
Dept. of Electr. & Comput. Eng., Auburn Univ., AL, USA
Volume
48
Issue
6
fYear
2001
fDate
12/1/2001 12:00:00 AM
Firstpage
1849
Lastpage
1854
Abstract
This paper presents single-event effect (SEE) modeling results of circuit-hardened SiGe heterojunction bipolar transistor logic circuits. A simple equivalent circuit is proposed to model the ion-induced currents at all of the terminals, including the p-type substrate. The SEE sensitivity of a D-flip-flop was simulated using the proposed equivalent circuit. The simulation results are qualitatively consistent with earlier SEE testing results. The circuit upset is shown to be independent of the number of active paths. Considerable charge collection occurs through the reverse-biased n-collector/p-substrate junction, regardless of the status of the emitter steering current, resulting in circuit upset through the commonly connected load resistor. A heavily doped substrate is shown to be beneficial for SEE
Keywords
Ge-Si alloys; bipolar logic circuits; current-mode logic; equivalent circuits; flip-flops; heavily doped semiconductors; heterojunction bipolar transistors; integrated circuit modelling; radiation hardening (electronics); CML; D-flip-flop; SEE modeling; SEE sensitivity; SiGe; charge collection; circuit upset; circuit-hardened SiGe logic circuits; commonly connected load resistor; current-mode logic; equivalent circuit; heavily doped substrate; heterojunction bipolar transistor logic circuits; high-speed SiGe HBT logic; ion-induced currents; p-type substrate; reverse-biased n-collector/p-substrate junction; simulation; single-event effect modeling; Circuit simulation; Circuit testing; Electric variables; Equivalent circuits; Germanium silicon alloys; Heterojunction bipolar transistors; Logic circuits; Microwave technology; Semiconductor process modeling; Silicon germanium;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.983141
Filename
983141
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