DocumentCode
1561621
Title
Benefit of dual layer silicon nitride anti-reflection coating
Author
Kumar, Bikash ; Pandian, T. Baskara ; Sreekiran, E. ; Narayanan, Srinivasamohan
Author_Institution
Tata BP Solar, Bangalore, India
fYear
2005
Firstpage
1205
Lastpage
1208
Abstract
Majority of commercial silicon solar cell technology around the world is based on screen print technology with or without a single or combined layer of titanium dioxide, silicon dioxide or recently PECVD silicon nitride. Most of the reported work on dual layer anti-reflection coating is based on two different materials. Less work has been done on dual layer silicon nitride for this purpose. In this work, a simple approach is presented to utilize dual layer silicon nitride. An improvement in weighted average reflectance has been achieved compared to single layer silicon nitride layer by this approach.
Keywords
antireflection coatings; elemental semiconductors; optical losses; plasma CVD; reflectivity; refractive index; silicon; silicon compounds; solar cells; PECVD; Si; SiN; commercial silicon solar cell technology; dual layer silicon nitride anti-reflection coating; reflectance; screen print technology; silicon dioxide; titanium dioxide; Coatings; Equations; Etching; Optical polarization; Optical reflection; Optical refraction; Photovoltaic cells; Reflectivity; Refractive index; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
ISSN
0160-8371
Print_ISBN
0-7803-8707-4
Type
conf
DOI
10.1109/PVSC.2005.1488355
Filename
1488355
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