• DocumentCode
    1561621
  • Title

    Benefit of dual layer silicon nitride anti-reflection coating

  • Author

    Kumar, Bikash ; Pandian, T. Baskara ; Sreekiran, E. ; Narayanan, Srinivasamohan

  • Author_Institution
    Tata BP Solar, Bangalore, India
  • fYear
    2005
  • Firstpage
    1205
  • Lastpage
    1208
  • Abstract
    Majority of commercial silicon solar cell technology around the world is based on screen print technology with or without a single or combined layer of titanium dioxide, silicon dioxide or recently PECVD silicon nitride. Most of the reported work on dual layer anti-reflection coating is based on two different materials. Less work has been done on dual layer silicon nitride for this purpose. In this work, a simple approach is presented to utilize dual layer silicon nitride. An improvement in weighted average reflectance has been achieved compared to single layer silicon nitride layer by this approach.
  • Keywords
    antireflection coatings; elemental semiconductors; optical losses; plasma CVD; reflectivity; refractive index; silicon; silicon compounds; solar cells; PECVD; Si; SiN; commercial silicon solar cell technology; dual layer silicon nitride anti-reflection coating; reflectance; screen print technology; silicon dioxide; titanium dioxide; Coatings; Equations; Etching; Optical polarization; Optical reflection; Optical refraction; Photovoltaic cells; Reflectivity; Refractive index; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference, 2005. Conference Record of the Thirty-first IEEE
  • ISSN
    0160-8371
  • Print_ISBN
    0-7803-8707-4
  • Type

    conf

  • DOI
    10.1109/PVSC.2005.1488355
  • Filename
    1488355