• DocumentCode
    1564383
  • Title

    Effectively Reducing the CoO & Minimized PFC Emission by Successful Evaluating CVD Alternative Cleaning Gas, Zyron® c-C4F8

  • Author

    Hsu, J.M. ; Chen, Mei ; Kuo, Y.C. ; Lee, T.T. ; Loh, Gabriel

  • Author_Institution
    United Microelectron. Corp., Hsinchu
  • fYear
    2008
  • Firstpage
    90
  • Lastpage
    93
  • Abstract
    In this paper, we illustrate the successful replacement of C3F8 with Zyronreg c-C4F8according to its high utilization efficiency in the PECVD chamber-cleaning process, which results in substantially reduced manufacturing costs, cleaning time and perfluorocarbon (PFC) emissions, by an effective and complete evaluation method with DOE matrix in Novellus Concept-2 tools. During the qualifying, we also proved the results are consistent with the IPCC 2006 official announcement of gases properties and concurrently mitigated the abasement system loading of the PFC emissions treatment.
  • Keywords
    environmental factors; plasma CVD; CVD alternative cleaning gas; DOE matrix; Novellus Concept-2 tools; PFC emission; PFC emissions treatment; abasement system loading; chamber-cleaning process; gas properties; perfluorocarbon emissions; substantially reduced manufacturing costs; utilization efficiency; Carbon dioxide; Cleaning; Costs; Gases; Global warming; IEEE news; Manufacturing processes; Microelectronics; Pulp manufacturing; US Department of Energy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
  • Conference_Location
    Cambridge, MA
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4244-1964-7
  • Electronic_ISBN
    1078-8743
  • Type

    conf

  • DOI
    10.1109/ASMC.2008.4529016
  • Filename
    4529016