DocumentCode
1564383
Title
Effectively Reducing the CoO & Minimized PFC Emission by Successful Evaluating CVD Alternative Cleaning Gas, Zyron® c-C4F8
Author
Hsu, J.M. ; Chen, Mei ; Kuo, Y.C. ; Lee, T.T. ; Loh, Gabriel
Author_Institution
United Microelectron. Corp., Hsinchu
fYear
2008
Firstpage
90
Lastpage
93
Abstract
In this paper, we illustrate the successful replacement of C3F8 with Zyronreg c-C4F8according to its high utilization efficiency in the PECVD chamber-cleaning process, which results in substantially reduced manufacturing costs, cleaning time and perfluorocarbon (PFC) emissions, by an effective and complete evaluation method with DOE matrix in Novellus Concept-2 tools. During the qualifying, we also proved the results are consistent with the IPCC 2006 official announcement of gases properties and concurrently mitigated the abasement system loading of the PFC emissions treatment.
Keywords
environmental factors; plasma CVD; CVD alternative cleaning gas; DOE matrix; Novellus Concept-2 tools; PFC emission; PFC emissions treatment; abasement system loading; chamber-cleaning process; gas properties; perfluorocarbon emissions; substantially reduced manufacturing costs; utilization efficiency; Carbon dioxide; Cleaning; Costs; Gases; Global warming; IEEE news; Manufacturing processes; Microelectronics; Pulp manufacturing; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location
Cambridge, MA
ISSN
1078-8743
Print_ISBN
978-1-4244-1964-7
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2008.4529016
Filename
4529016
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