The distribution analysis for elements in depth of nitride coating based on high-entropy Ti-Hf-V-Nb-Zr alloy

Author

Bagdasaryan, A.A. ; Konarski, P. ; Misnik, M. ; Komarov, F.F.

Author_Institution

Sumy State Univ., Sumy, Ukraine

fYear

2014

fDate

7-13 Sept. 2014

Firstpage

779

Lastpage

780

Abstract

The element-structural analysis of the nitride coatings obtained by vacuum arc evaporation from high-entropy cathodes of Ti-Hf-V-Nb-Zr was carried out. The use of complementary methods of elemental analysis (RBS, SIMS and GDMS) allowed making a comprehensive analysis of the elemental composition of the investigated coating, namely determining the elemental composition of the surface layer, identifying the uncontrolled impurities (O, C), as well as the changes in the concentration of elements with depth.

Keywords

Rutherford backscattering; hafnium compounds; niobium compounds; secondary ion mass spectra; titanium compounds; vacuum deposited coatings; vacuum deposition; vanadium compounds; zirconium compounds; (TiHfVNbZr)N; GDMS; RBS; SIMS; distribution analysis; element concentration; element-structural analysis; elemental composition analysis; high-entropy Ti-Hf-V-Nb-Zr alloy; high-entropy cathodes; nitride coating depth; surface layer; uncontrolled impurities; vacuum arc evaporation; Niobium;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave & Telecommunication Technology (CriMiCo), 2014 24th International Crimean Conference

Conference_Location

Sevastopol

Print_ISBN

978-966-335-412-5

Type

conf

DOI

10.1109/CRMICO.2014.6959628

Filename

6959628