DocumentCode
1564931
Title
Industry Survey of Wafer Fab Reticle Control Quality Strategies
Author
Dover, Russell
Author_Institution
KLA-Tencor Corp., San Jose, CA
fYear
2008
Firstpage
372
Lastpage
374
Abstract
Reticle quality control in wafer fabs is different from quality control in mask shops. As such an industrywide survey was undertaken to benchmark different strategies and approaches taken. This paper summarizes the results while retaining the different wafer fabs´ anonymity and confidentiality. The approach taken for the survey was specifically designed to be impartial and independent of any tools, solutions or applications available from KLA-Tencor.
Keywords
quality control; reticles; mask shop quality control; reticle quality control; wafer fab reticle; Contamination; Industrial control; Inspection; Lithography; Logic; Monitoring; Quality control; Random access memory; Research and development; Testing; Inspection; STARlight; crystal growth; lithography; mask defects; progressive defects; strategy;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location
Cambridge, MA
ISSN
1078-8743
Print_ISBN
978-1-4244-1964-7
Electronic_ISBN
1078-8743
Type
conf
DOI
10.1109/ASMC.2008.4529073
Filename
4529073
Link To Document