DocumentCode
1568401
Title
TID and SEE Response of an Advanced Samsung 4Gb NAND Flash Memory
Author
Oldham, Timothy R. ; Friendlich, Mark ; Howard, James W., Jr. ; Berg, Melanie D. ; Kim, Hak S. ; Irwin, Timithy L. ; LaBel, Kenneth A.
Author_Institution
NASA, Greenbelt
Volume
0
fYear
2007
Firstpage
221
Lastpage
225
Abstract
Initial total ionizing dose (TID) and single event heavy ion test results are presented for an unhardened commercial flash memory, fabricated with 63 nm technology. Results are that the parts survive to a TID of nearly 200 krad (SiCh), with a tractable soft error rate of about 10-12 errors/bit-day, for the Adams ten percent worst case environment.
Keywords
NAND circuits; flash memories; ion beam effects; nanoelectronics; Samsung NAND flash memory; fabrication technology; nonvolatile memory; radiation effects; single event effects; single event heavy ion test; size 63 nm; total ionizing dose; tractable soft error rate; unhardened flash memory; Consumer electronics; Flash memory; Manufacturing; NASA; Nonvolatile memory; Power supplies; Radiation effects; Space technology; Testing; USA Councils; NAND flash; nonvolatile memory; radiation effects; single event effects (SEE); total ionizing dose (TID);
fLanguage
English
Publisher
ieee
Conference_Titel
Radiation Effects Data Workshop, 2007 IEEE
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-1464-2
Type
conf
DOI
10.1109/REDW.2007.4342570
Filename
4342570
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