C dot arrays by ion beam induced chemical vapor deposition (IBICVD)

Summary form only given. The idea to pattem the medium for magnetic recording has timulated numerous propositions for fabrication methods. The previously reported development of the IBICVD [I] towards nanoscale fabrication utilizes a focused ion beam (FIB) system. Although best suitable for the laboratory scale, it has its analog among ion projection schemes aming at commercial applications. The principle of the method relies on the energy and momentum exchange between ions (30 keV Ga") and molecules of a precursor suitable for the metal of interest. Collisionally induced decomposition of the precursor is followed by dynamic deposition of the metal on the substrate surface.