DocumentCode
1574402
Title
Determination of trap energy levels in AlGaN/GaN HEMT
Author
Jie Yang ; Cui, Shuguang ; Ma, T.P. ; Ting-Hsiang Hung ; Nath, Dipen ; Krishnamoorthy, Sriram ; Rajan, Sreeraman
Author_Institution
Dept. of Electr. Eng., Yale Univ., New Haven, CT, USA
fYear
2013
Firstpage
79
Lastpage
80
Abstract
The density of two dimensional electron gas (2DEG) in the channel of AlGaN/GaN HEMT is often altered by trapped charges on the surface or in the bulk of the heterostructure, limiting the device performance at high frequencies. The existing methods, such as photoionization spectroscopy, Deep Level Transient Spectroscopy (DLTS) etc., mainly focus on deep level traps in GaN, providing little information about traps in the AlGaN layer. In this work, we use Inelastic Electron Tunneling Spectroscopy (IETS), in conjunction with the Frenkel-Poole (F-P) trap energy extraction method developed by Yeh at el, to examine electrically active traps in the AlGaN barrier layer. The results indicate that traps exist in the AlGaN bulk, as well as at the AlGaN/GaN interface. The trap energy levels are within a 0.5eV band below the conduction band edge (Ec) of AlGaN in the sample that we studied.
Keywords
III-V semiconductors; aluminium compounds; conduction bands; deep level transient spectroscopy; deep levels; energy states; gallium compounds; high electron mobility transistors; tunnelling spectroscopy; two-dimensional electron gas; wide band gap semiconductors; 2DEG; AlGaN-GaN; Frenkel-Poole trap energy extraction method; HEMT; IETS; barrier layer; conduction band edge; deep level transient spectroscopy; deep level traps; device performance; electrically active traps; inelastic electron tunneling spectroscopy; photoionization spectroscopy; trap energy levels; trapped charges; two dimensional electron gas; Aluminum gallium nitride; Electron traps; Energy states; Gallium nitride; HEMTs; Logic gates; MODFETs;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2013 71st Annual
Conference_Location
Notre Dame, IN
ISSN
1548-3770
Print_ISBN
978-1-4799-0811-0
Type
conf
DOI
10.1109/DRC.2013.6633802
Filename
6633802
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