DocumentCode
1579217
Title
Advanced Process Control: benefits for photolithography process control
Author
Gould, Christopher
Author_Institution
Infineon Technol. Richmond, Sandston, VA, USA
fYear
2002
fDate
6/24/1905 12:00:00 AM
Firstpage
98
Lastpage
100
Abstract
High volume, cost effective, manufacturing of state of the art lithography processes requires in depth understanding of Process and Process-Tool interaction to achieve Advanced Process Control (APC). The APC systems being deployed at Infineon Technologies, Richmond has shown and is expected to continue demonstrating continuous improvement for the following primary metrics: · OL and CD Cpk · Rework Reduction · Reduction of MTTD · Lot Cycle Time improvement.
Keywords
photolithography; process control; Advanced Process Control system; photolithography process control; semiconductor manufacturing; Automatic control; Control systems; Fault detection; Lithography; Manufacturing processes; Metrology; Predictive models; Process control; Semiconductor device manufacture; Semiconductor device modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN
0-7803-7158-5
Type
conf
DOI
10.1109/ASMC.2002.1001582
Filename
1001582
Link To Document