DocumentCode
1580206
Title
Study of airborne molecular contamination in minienvironments
Author
Zhu, Sheng-Bai
Author_Institution
Asyst Technol. Inc, Fremont, CA, USA
fYear
2002
fDate
6/24/1905 12:00:00 AM
Firstpage
309
Lastpage
313
Abstract
A comprehensive study of airborne molecular contamination (AMC) in minienvironments is presented in this paper. The impact of AMC on semiconductor manufacturing processes is reviewed. Models that describe contamination mechanisms are developed. The technologies and performance of minienvironments in contamination control are discussed based on theoretical models and experimental data.
Keywords
clean rooms; filtration; integrated circuit manufacture; semiconductor process modelling; surface contamination; airborne molecular contamination; chemical filtration; cleanrooms; contamination control; contamination mechanisms; hermetic seal; minienvironments; models; semiconductor manufacturing processes; wafer processes; Chemical processes; Chemical technology; Equations; Manufacturing processes; Optical films; Optical sensors; Semiconductor device modeling; Solids; Surface contamination; Surface resistance;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing 2002 IEEE/SEMI Conference and Workshop
Print_ISBN
0-7803-7158-5
Type
conf
DOI
10.1109/ASMC.2002.1001624
Filename
1001624
Link To Document