• DocumentCode
    1588975
  • Title

    Development of 2.4 MJ capacitor bank for electro thermal propulsion technology

  • Author

    Sung, G.Y. ; Kim, J.S. ; Chu, J.H. ; Jung, J.W.

  • Author_Institution
    Agency for Defense Dev., Taejon, South Korea
  • Volume
    1
  • fYear
    2001
  • Firstpage
    199
  • Abstract
    A pulsed power supply of 2.4 MJ capacitor bank has been developed to make investigation into electric gun technology. It is made up of eight paralleled 300 kJ modules, and can supply various shapes of high current pulse by controlling charging voltage, inductance, capacitance, and firing time of each module. The 300 kJ module has been designed and fabricated for maximum operating voltage of 22 kV, peak current of 150 kA, and pulse duration of 1 msec. The equivalent circuit of the module was determined, and the experiments of the modules were done. The characteristics of the module were analyzed more deeply through circuit simulation. All the modules showed good performance under the condition of charging voltage of 22 kV, inductance of 20 /spl mu/H, and shorted load. The experiments of the paralleled modules with inductance of 20 /spl mu/H and load resistance of 100 m/spl Omega/ were performed, where the modules were discharged simultaneously and/or sequentially. The results of the experiments were analyzed. The 2.4 MJ capacitor bank is now used as the pulsed power supply for the ETC (electro thermal chemical) gun research.
  • Keywords
    capacitance; capacitor storage; electrothermal launchers; equivalent circuits; inductance; pulse generators; pulsed power supplies; voltage control; 1 ms; 100 mohm; 150 kA; 2.4 MJ; 22 kV; 300 kJ; capacitance; capacitor bank; charging voltage; charging voltage control; circuit simulation; electric gun technology; electro thermal chemical gun; equivalent circuit; firing time; high current pulse shapes; inductance; load resistance; maximum operating voltage; pulsed power supply; shorted load; Capacitance; Capacitors; Equivalent circuits; Firing; Inductance; Propulsion; Pulse shaping methods; Pulsed power supplies; Shape control; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Plasma Science, 2001. PPPS-2001. Digest of Technical Papers
  • Conference_Location
    Las Vegas, NV, USA
  • Print_ISBN
    0-7803-7120-8
  • Type

    conf

  • DOI
    10.1109/PPPS.2001.1002027
  • Filename
    1002027