Effect of Gold catalyst thickness on Zinc Oxide thin films

Author

Shariffudin, S.S. ; Musa, M.Z. ; Mamat, M.H. ; Rusop, M.

Author_Institution

Solar Cell Lab., Univ. Teknol. MARA, Shah Alam, Malaysia

fYear

2010

Firstpage

72

Lastpage

75

Abstract

ZnO thin films were deposited using thermal chemical vapor deposition (TCVD) using gold as the catalyst in a two furnaces system. Carbothermal technique is employed in this work where graphite was mixed into ZnO powder with 1:1 ratio as the precursor. Different thicknesses of gold were deposited on the substrate to study its effect to the properties of the thin films. The ZnO nanostructures were then characterized using field emission scanning electron microscopy (FE-SEM), photoluminescence (PL) measurement, and current-voltage (I-V) measurement. Influence of the catalyst thicknesses on the morphology, electrical properties and photoluminescence of ZnO nanostructures is discussed.

Keywords

II-VI semiconductors; catalysts; chemical vapour deposition; field emission; gold; nanostructured materials; photoluminescence; scanning electron microscopy; semiconductor growth; wide band gap semiconductors; zinc compounds; Au; FE-SEM; ZnO; carbothermal technique; current-voltage measurement; electrical properties; field emission scanning electron microscopy; gold catalyst thickness; graphite; mixing; morphology; photoluminescence measurement; thermal chemical vapor deposition; two-furnace system; zinc oxide nanostructures; zinc oxide powder; zinc oxide thin films; Chemical vapor deposition; Current measurement; Furnaces; Gold; Nanostructures; Photoluminescence; Powders; Sputtering; Transistors; Zinc oxide;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Electronics (ICSE), 2010 IEEE International Conference on

Conference_Location

Melaka

Print_ISBN

978-1-4244-6608-5

Type

conf

DOI

10.1109/SMELEC.2010.5549435

Filename

5549435