DocumentCode
1590940
Title
Transparent conducting thin films of fluoro doped tin oxide (FTO) deposited using inkjet printing technique
Author
Samad, Wan Zurina ; Salleh, Muhamad Mat ; Shafiee, Ashkan ; Yarmo, Mohd Ambar
Author_Institution
Sch. of Chem. Sci. & Food Technol., Univ. Kebangsaan Malaysia, Bangi, Malaysia
fYear
2010
Firstpage
52
Lastpage
55
Abstract
FTO thin films were successfully prepared by inkjet printing technique. FTO precursor was prepared by reacting SnCl4.5H2O and NH4F at 60°C in a sealed container. The number of layers was set up from two to five layers on the glass substrate and was deposited at room temperature around 25 to 27°C, 40°C and 60°C to determine the optimum properties for thin films performance. Morphology analysis study using VP-SEM shows the existence of fine grains with the size ranging 20 to 30 nm and the existence of crystal shape with the increases of deposition temperature. Fluorine concentration in the thin films determined from XPS analysis shows the ratio of[F]/[Sn] at 0.02 with the Sn d5/2 Sn 4+, O1s as O2-, and F1s as Sn-F bond peaks at binding energy 486.6 eV, 530.5 eV and 684.4 eV. The optical transmittance analysis showed the deposition temperature improved the optical transmittance; 60% T at ambient to 80% T at 60°C. The optimum optical transmittance was 91% T for the thin film deposited at 40°C. The sheet resistances were 16 Ω/□, 21 Ω/□ 23 Ω/□ for the thin film deposited at 40°C, ambient temperature and 60°C.
Keywords
X-ray photoelectron spectra; binding energy; electrical resistivity; ink jet printing; optical films; scanning electron microscopy; thin films; transparency; FTO thin films; SnO:F; VP-SEM; XPS analysis; binding energy; deposition temperature; electron volt energy 486.6 eV; electron volt energy 530.5 eV; electron volt energy 684.4 eV; fluoro doped tin oxide; glass substrate; inkjet printing technique; morphology analysis study; optimum optical transmittance; sealed container; sheet resistances; size 20 nm to 30 nm; temperature 293 K to 298 K; temperature 40 degC; temperature 60 degC; transparent conducting thin films; Containers; Glass; Morphology; Optical films; Printing; Sputtering; Substrates; Temperature; Tin; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics (ICSE), 2010 IEEE International Conference on
Conference_Location
Melaka
Print_ISBN
978-1-4244-6608-5
Type
conf
DOI
10.1109/SMELEC.2010.5549462
Filename
5549462
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