• DocumentCode
    1592776
  • Title

    Self-consistent convective fluid model for moderate pressure microwave plasma-assisted chemical vapor deposition reactors

  • Author

    Meierbachtol, Collin S. ; Grotjohn, Timothy A. ; Shanker, Balasubramaniam

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
  • fYear
    2013
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Microwave plasma-assisted chemical vapor deposition (PACVD) reactors are used for the production of high quality diamond films. Microwave PACVD systems have traditionally been operated at pressures between 10 and 150 Torr, resulting in diamond growth rates of up to 5 um/hr.
  • Keywords
    chemical reactors; diamond; microwave materials processing; plasma CVD; thin films; C; PACVD reactors; diamond growth rates; high quality diamond films; microwave PACVD systems; moderate pressure microwave plasma-assisted chemical vapor deposition reactors; pressure 10 torr to 150 torr; self-consistent convective fluid model;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
  • Conference_Location
    San Francisco, CA
  • ISSN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2013.6634855
  • Filename
    6634855
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1592776