Polarity effect on the behavior of gas-puff z-pinch plasma produced by IPP system

Author

Imasaka, K. ; Takahashi, K. ; Suehiro, J. ; Hara, M.

Author_Institution

Dept. of Electr. & Electron. Syst. Eng., Kyushu Univ., Fukuoka, Japan

Volume

1

fYear

2001

Firstpage

757

Abstract

Hot spots produced by gas-puff z-pinch plasma which are high energy density plasma regions radiate intensive soft X-rays. The gas-puff z-pinch is expected to have industrial applications such as soft X-ray lithography, microscopy and in lasers. In these cases, the scattering of hot spots is important when the gas-puff z-pinch plasma is used as a point source of soft X-rays. Previous results in our study showed the reduction of radial displacement of hot spots in positive voltage shots by using an IPP (Inductive Pulsed Power) system. In this paper, the voltage polarity effects on the gas-puff z-pinch plasma behavior, spatial distribution of hot spots and soft X-ray emission are described.

Keywords

X-ray production; Z pinch; fusion reactor theory; plasma density; plasma diagnostics; plasma temperature; plasma transport processes; pulsed power supplies; IPP system; X-ray emission; X-ray lasers; X-ray lithography; X-ray microscopy; gas-puff z-pinch plasma; high energy density plasma regions; hot spots; inductive pulsed power system; plasma behavior; plasma compression phenomenon; polarity effect; positive voltage shots; radial displacement; soft X-rays; spatial distribution; spatial stability; Gas industry; Gas lasers; Microscopy; Plasma applications; Plasma density; Plasma sources; Plasma x-ray sources; Voltage; X-ray lasers; X-ray lithography;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Plasma Science, 2001. PPPS-2001. Digest of Technical Papers

Conference_Location

Las Vegas, NV, USA

Print_ISBN

0-7803-7120-8

Type

conf

DOI

10.1109/PPPS.2001.1002207

Filename

1002207