• DocumentCode
    1598402
  • Title

    A new two-layer power/ground router for VLSI layout

  • Author

    Chi, Jun Cheng ; Chi, Mely Chen

  • Author_Institution
    Dept. of Inf. & Comput. Eng., Chung Yuan Christian Univ., Chung Li, Taiwan
  • fYear
    2001
  • fDate
    6/23/1905 12:00:00 AM
  • Firstpage
    157
  • Lastpage
    160
  • Abstract
    The authors present a new router which can be used to route power and ground nets through the use of double metal layers. It was developed for integrated circuit designs. A chip may have multiple power/ground pads located on any side of the chip. Multiple trees may be constructed for power or ground nets to consume as small as possible routing resource. The routing algorithm used is a modification of Dijkstra´s algorithm, which searches for the shortest path between a pin and a pad. It uses a new metric for the cost function. The cost is the total area of routing wires and the additional pitch region due to the routing path. Corner reduction is also considered. This new metric is more accurate in measuring the quality of routing than wire length/area alone because the reserved pitch region may not be used for routing any other net. The power and ground nets are routed under the constraints of electromigration and voltage drop of the chip. Experimental results are shown
  • Keywords
    CMOS integrated circuits; VLSI; circuit layout CAD; integrated circuit layout; network routing; VLSI layout; corner reduction; cost function metric; double metal layers; electromigration constraint; ground nets; integrated circuit designs; multiple trees; power nets; reserved pitch region; routing algorithm; two-layer power/ground router; voltage drop constraint; Area measurement; Cost function; Electromigration; Integrated circuit synthesis; Length measurement; Routing; Semiconductor device measurement; Very large scale integration; Voltage; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ASIC/SOC Conference, 2001. Proceedings. 14th Annual IEEE International
  • Conference_Location
    Arlington, VA
  • Print_ISBN
    0-7803-6741-3
  • Type

    conf

  • DOI
    10.1109/ASIC.2001.954690
  • Filename
    954690