Pulsed laser deposition of carbon films

Summary form only given. In the present paper, we report a comprehensive study of the emission characteristics of the laser produced plasma used for carbon film deposition in the presence of ambient atmosphere at both low and high irradiances. The use of fast photography using ICCD in analysing the plasma plume is also discussed. The observed results on shock wave formation and the instability at the leading edge of the plume and various parameters like temperature, density, velocity etc, of the plasma will also be presented. The characterisation can yield important information on the pulsed laser deposition processes and to a better understanding of the deposited films.