Simulation of acoustic semiconductors signature of cracked surface

Nondestructive control simulation is a means of assessing the ability of methods to detect or characterize quickly and simply defects. In acoustic microscopy, the micro-characterization of the key materials used in the manufacture of electronics applications, is studying the basic parameters characterizing the mechanical properties of these materials by analyzing acoustic signatures, V (z). This last is evaluated by using a numerical simple approach in this work. So to study the effect of crack, located on the silicon surface, on the propagation of Rayleigh waves, we first apply the Schoch model to calculate the variation of the reflection coefficient modulus and second the sheppard-wilson model in order to simulate and then analyze V (z) by using the fast Fourier transform (F.F.T) spectrum.