Decomposition of dilute trichloroethylene by nonthermal plasma processing-catalyst and ozone effect

Author

Oda, Tetsuji ; Yamaji, Kei ; Takahashi, Tadashi

Author_Institution

Dept. of Electron. Eng., Tokyo Univ., Japan

Volume

1

fYear

2001

Firstpage

706

Abstract

Decomposition performance of dilute (100-1000 ppm) trichloroethylene (TCE) contaminated in air by using nonthermal plasma processing combined with catalyst or indirect plasma processing was newly studied. Some catalysts, such as vanadium oxide (V/sub 2/O/sub 5/) or tungsten oxide (WO/sub 3/), improve decomposition performance but byproducts by that process must be confirmed. Indirect plasma processing (plasma processed pure air is mixed with TCE contaminated air) suggests the existence of very active oxidation radicals after the plasma process whose generation is strongly related with the existence of oxygen molecules. The lifetime of that radical is about a few minutes but details are not yet clear.

Keywords

air pollution control; catalysts; decomposition; organic compounds; oxidation; ozone; plasma chemistry; plasma devices; tungsten compounds; vanadium compounds; V/sub 2/O/sub 5/; WO/sub 3/; active oxidation radicals; byproducts; catalyst; contaminated air; dilute trichloroethylene decomposition; indirect plasma processing; nonthermal plasma processing; oxygen molecules; ozone effect; plasma processed pure air; tungsten oxide; vanadium oxide; Fluid flow; Inductors; Oxidation; Petroleum; Plasma materials processing; Plasma stability; Production facilities; Solids; Surface contamination; Tungsten;

fLanguage

English

Publisher

ieee

Conference_Titel

Industry Applications Conference, 2001. Thirty-Sixth IAS Annual Meeting. Conference Record of the 2001 IEEE

Conference_Location

Chicago, IL, USA

ISSN

0197-2618

Print_ISBN

0-7803-7114-3

Type

conf

DOI

10.1109/IAS.2001.955498

Filename

955498